Full range test

Tested for industrial use on planar and rotatable magnetrons in joint collaboration with our customers and partners

Stable and robust

Stable and robust discharge process (constant voltage and no unwanted oscillations)

Externally triggered

Externally triggered and can also be controlled in master-slave configuration (multiple power supplies)

Need a DC driving unit?

The HiPSTER series offer an easy upgrade of an existing magnetron deposition system to true HiPIMS. If you already have a DC power supply capable of delivering ~1000 V and ~10 kW then all you need is the HiPSTER 10 unit.

If you also need a DC driving unit then please have a look at the HiPSTER DCPSU:s and contact us for a package deal.

Reactive HiPIMS process control option can be implemented upon request. This feature allows:

• Stable operation in the transition mode
• Wide process window of reactive gas flow with maintained stoichiometric composition

Output Specifications

• Average Power: 10 000 W
• Peak Voltage: 1000 V
• Peak Current: 1000 A
• Regulation Modes: Voltage, Current, Power, Puls current, Pulse charge
• Pulse frequency: 50-10 000 Hz
• Pulse Duration: 3.5 µs to 1000 µs
• Arc control: reaction time < 2 µs

Dimensions

• 19" rack (6U)
  266 mm (H) x 435 mm (W) x 490mm (D)
• Weight: ≈ 26kg